Rev. Phys. Appl. (Paris) 1, 71-73 (1966)
DOI: 10.1051/rphysap:019660010107100

Dispositif interférentiel destiné à la mesure de l'épaisseur mécanique de couches minces

H. Dupoisot et P. Lostis

Institut d'Optique, Paris

Abstract
The article shows low it is possible to reverse the contrast of multiple wave fringes and consequently improve the sharpness of these fringes. This method has been utilized to measure the mechanical thickness of thin films and to control the flatness of the support. The precision is of the order of 3 Angströms.

Résumé
Cet article montre comment il est possible d'inverser le contraste des franges à ondes multiples et ainsi d'améliorer le pointé de ces franges. Cette méthode a été utilisée pour mesurer l'épaisseur mécanique de couches minces et contrôler la planéité de support. La précision est de l'ordre de 3 Angströms.

PACS
0630B - Spatial dimensions (e.g., position, lengths, volume, angles, and displacements).
0760L - Interferometers.

Key words
Light interferometry -- Measuring methods -- Optical method -- Thickness measurement -- Thin film -- Flatness

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