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Article cité :

Differential Hall Effect Metrology for Electrical Characterization of Advanced Semiconductor Layers

Bulent M. Basol and Abhijeet Joshi
Metrology 4 (4) 547 (2024)
https://doi.org/10.3390/metrology4040034

Study of Dopant Activation in Silicon Employing Differential Hall Effect Metrology (DHEM)

Abhijeet Joshi and Bulent M. Basol
IEEE Journal of the Electron Devices Society 10 757 (2022)
https://doi.org/10.1109/JEDS.2022.3148048

Determination of doping and mobility profiles by automatic electrical measurements and anodic stripping

L Bouro and D Tsoukalas
Journal of Physics E: Scientific Instruments 20 (5) 541 (1987)
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E. Landi, S. Guimaraes and S. Solmi
Applied Physics A Solids and Surfaces 44 (2) 135 (1987)
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Fully automatic apparatus for the determination of doping profiles in Si by electrical measurements and anodic stripping

R. Galloni and A. Sardo
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Experimental and computer analysis of P+-ion penetration tails in a SIO2-Si two-layer system

A. Desalvo, R. Galloni, R. Rosa and F. Zignani
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