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Article cité :
D. Morvan , J. Amouroux , M. C. Charpin , H. Lauvray
Rev. Phys. Appl. (Paris), 18 4 (1983) 239-251
Citations de cet article :
11 articles
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Atomic emission spectroscopy method for mixing studies in high power thermal plasmas
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High-Temperature Refining of Metallurgical-Grade Silicon: A Review
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