A mass spectrometric diagnostic of C2F6 and CHF 3 plasmas during etching of SiO2 and Si G. Turban, B. Grolleau, P. Launay et P. BriaudRev. Phys. Appl. (Paris), 20 8 (1985) 609-620DOI: https://doi.org/10.1051/rphysap:01985002008060900
