Microstructure effect on the HNO3-HF etching of LPCVD boron-doped polycrystalline silicon F. Mansour-Bahloul, D. Bielle-Daspet et A. PeyrelavigneRev. Phys. Appl. (Paris), 22 7 (1987) 671-676DOI: https://doi.org/10.1051/rphysap:01987002207067100
