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Cited article:

Trends in photoresist materials for extreme ultraviolet lithography: A review

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Materials Today 67 299 (2023)
https://doi.org/10.1016/j.mattod.2023.05.027

The Influence of H2Plasma Treatment on LWR Mitigation: The Importance of EUV Photoresist Composition

Peter De Schepper, Ziad el Otell, Alessandro Vaglio Pret, Efrain Altamirano-Sanchez and Stefan De Gendt
Plasma Processes and Polymers 12 (7) 624 (2015)
https://doi.org/10.1002/ppap.201400157

Current Status for Soft X-ray/Extreme Ultra-Violet Optical Devices

Hisataka TAKENAKA, Satoshi ICHIMARU and Masatoshi HATAYAMA
The Review of Laser Engineering 42 (1) 60 (2014)
https://doi.org/10.2184/lsj.42.1_60

History of extreme ultraviolet lithography

Hiroo Kinoshita
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 23 (6) 2584 (2005)
https://doi.org/10.1116/1.2127950

Multilayer transmission polarizers in the soft X-ray region

A Derossi, F Lama, M Piacentini and N Zema
Pure and Applied Optics: Journal of the European Optical Society Part A 3 (4) 643 (1994)
https://doi.org/10.1088/0963-9659/3/4/027

Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system

H. Kinoshita, K. Kurihara, T. Mizota, et al.
Applied Optics 32 (34) 7079 (1993)
https://doi.org/10.1364/AO.32.007079

AES depth profiling of a new type of multilayer structure composed of Cr/Ni layers of various thicknesses

A Zalar, P Panjan and S Hofmann
Thin Solid Films 181 (1-2) 277 (1989)
https://doi.org/10.1016/0040-6090(89)90495-1