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Simultaneous nuclear microanalysis of nitrogen and oxygen on silicon

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Nuclear Instruments and Methods in Physics Research 201 (2-3) 473 (1982)
DOI: 10.1016/0167-5087(82)90582-8
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Physics of Nonmetallic Thin Films

A. Cachard
Physics of Nonmetallic Thin Films 141 (1976)
DOI: 10.1007/978-1-4684-0847-8_6
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An examination of carbon diffusion profiles in steel specimens by means of the nuclear microprobe

T.B. Pierce, J.W. McMillan, P.F. Peck and I.G. Jones
Nuclear Instruments and Methods 118 (1) 115 (1974)
DOI: 10.1016/0029-554X(74)90691-0
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Plasticity of stoichiometric SiO thin films

J. Pivot, D. Morelli, J. Tardy, J.A. Roger and C.H.S. Dupuy
Thin Solid Films 28 (2) 357 (1975)
DOI: 10.1016/0040-6090(75)90127-3
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Structural influence on electrical properties of metal-oxide-metal devices

A. Cachard, J.A. Roger, J. Pivot, C. Diaine and C.H.S. Dupuy
Thin Solid Films 13 (2) 231 (1972)
DOI: 10.1016/0040-6090(72)90288-X
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Mechanical properties of SiOx thin films

J. Pivot
Thin Solid Films 89 (2) 175 (1982)
DOI: 10.1016/0040-6090(82)90446-1
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Mechanical properties of stoichiometric SiO thin films: Evidence of plasticity

J. Pivot, D. Morelli, J.A. Roger and C.H.S. Dupuy
Thin Solid Films 34 (2) 205 (1976)
DOI: 10.1016/0040-6090(76)90456-9
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Evidence for interfacial space‐charge regions in electron‐beam‐evaporated SiO

Jean‐Alain Roger, C. H. S. Dupuy and Stephen J. Fonash
Journal of Applied Physics 46 (7) 3102 (1975)
DOI: 10.1063/1.322006
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Utilisation d'ions lithium pour l'analyse des surfaces et des couches minces

J.P. Thomas, A. Cachard, M. Fallavier, et al.
Revue de Physique Appliquée 11 (1) 65 (1976)
DOI: 10.1051/rphysap:0197600110106500
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Analyse chimique des solides non cristallins en surface et en couches minces

J. Tousset
Revue de Physique Appliquée 12 (5) 781 (1977)
DOI: 10.1051/rphysap:01977001205078100
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Material Characterization Using Ion Beams

A. Cachard, J. P. Thomas and E. Ligeon
Material Characterization Using Ion Beams 367 (1978)
DOI: 10.1007/978-1-4684-0856-0_11
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