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Low-field current transport mechanisms in rf magnetron sputter deposited boron carbide (B5C)/p-type crystalline silicon junctions in the dark

M. M. Abdul-Gader, U. A. Al-Binni, Ahmad A. Ahmad, M. A. Al-Basha and N. J. Ianno
International Journal of Electronics 88 (8) 873 (2001)
https://doi.org/10.1080/00207210110058120

Substitutional doping and photovoltaic application of RF magnetron sputtered a-Si:H

W. Müller, H. Rübel, B. Schröder and J. Geiger
Solar Energy Materials 13 (5) 385 (1986)
https://doi.org/10.1016/0165-1633(86)90086-9

Studies of the frequency-dependent admittances of Schottky barriers formed on sputtered hydrogenated amorphous silicon

I. G. Gibb and A. R. Long
Philosophical Magazine B 49 (6) 565 (1984)
https://doi.org/10.1080/13642818408227646

Hydrogenated Amorphous Silicon - Part A: Preparation and Structure

T.D. Moustakas
Semiconductors and Semimetals, Hydrogenated Amorphous Silicon - Part A: Preparation and Structure 21 55 (1984)
https://doi.org/10.1016/S0080-8784(08)63022-7

Reactive sputtering of amorphous silicon in Ne, Ar, and Kr

R. C. Ross and R. Messier
Journal of Applied Physics 54 (10) 5744 (1983)
https://doi.org/10.1063/1.331797

Influence of hydrogen on the performance of magnetron-sputtered amorphous hydrogenated silicon field-effect transistors

Moafak C. Abdulrida and John Allison
Applied Physics Letters 43 (8) 768 (1983)
https://doi.org/10.1063/1.94500

Amorphous silicon p-i-n solar cells fabricated by reactive sputtering

T. D. Moustakas and R. Friedman
Applied Physics Letters 40 (6) 515 (1982)
https://doi.org/10.1063/1.93162

Microstructure and properties of rf-sputtered amorphous hydrogenated silicon films

R. C. Ross and R. Messier
Journal of Applied Physics 52 (8) 5329 (1981)
https://doi.org/10.1063/1.329391