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Cited article:

Etude de résines négatives sensibles aux électrons utilisées dans les procédés de microlithographie

B. Holil, R. Sagnes, B. Serre, F. Schué, C. Montginoul, L. Giral, F. Buiguez, C. Rosilio

Rev. Phys. Appl. (Paris), 20 3 (1985) 143-149

DOI: https://doi.org/10.1051/rphysap:01985002003014300

This article has been cited by the following article(s):

Synthèse de polystyrènes chlorométhylés renfermant de nouveaux groupements tétrathiafulvalénylcarbonyloxyméthyles

Henri Mora, Jean‐Marc Fabre, Louis Giral, et al.
Die Makromolekulare Chemie 193 (6) 1337 (1992)
https://doi.org/10.1002/macp.1992.021930610

Poly-4-bromostyrene, a high performance negative electron resist

F. Schué, B. Holil, R. Sagnes, et al.
Microelectronic Engineering 5 (1-4) 315 (1986)
https://doi.org/10.1016/0167-9317(86)90059-6